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Vistec Electron Beam GmbH

  • Booth: 1051

We understand E-BEAM.

Overview

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.

The company headquarters are located in Jena, Germany, with office and manufacturing facilities including 740 m² cleanroom space for assembly and qualification. Vistec Electron Beam also maintains service and support centers in Western Europe, Asia and in the US.


  Products

  • Vistec SB254
    The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands....

  • With its 210 x 210mm stage travel range the Vistec SB254 is the ideal tool for exposing masks up to 7inch and wafers up to 200mm diameter.
    The concept of the SB254 enables handling and exposure of transparent and non-transparent compound  semiconductor materials. The modular system architecture allows your SB254 to be adapted to meet your 
    application requirements.
  • Vistec SB3050-2
    The Vistec SB3050-2 – with Cell Projection (CP) option – is our commitment to semiconductor manufacturing professionals....

  • Designed to meet the challenges of direct patterning below the 32 nm technology node, the Vistec SB3050-2 features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization. Our industry proven 300 mm design concept has been successfully utilized in more than 10 installations worldwide. The Vistec SB3050-2 combines state of the art substrate handling with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to ensure excellent resolution performance.

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